Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2011-04-19
2011-04-19
Kik, Phallaka (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
C716S055000, C716S119000, C326S032000, C326S041000, C326S047000, C326S101000, C257S368000, C257S401000, C257S707000, C257S712000, C257S760000, C257S773000, C700S098000, C700S121000
Reexamination Certificate
active
07930658
ABSTRACT:
A semiconductor integrated circuit device and a fabrication method thereof are disclosed, for effective suppression of a temperature increase therein that is caused by heat generation of a semiconductor element. The semiconductor integrated circuit device includes a semiconductor element, a multi-layer wiring structure and a heat conduction part. The semiconductor element is formed on a support substrate. The multi-layer wiring structure is formed in an insulation film on the support substrate and includes at least one connection hole and at least one metal wiring layer. The heat conduction part is formed of the same conductive materials as the connection hole and the metal wiring layer and extends toward an upper layer side along a path different from a wiring path including a connection hole and a metal wiring for signal transmission.
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Dickstein & Shapiro LLP
Kik Phallaka
Ricoh & Company, Ltd.
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