Selective optical proximity layout design data correction

Details Selective optical proximity layout design data correction Selective optical proximity layout design data correction

2011-04-12

2011-04-12

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

C716S051000

Reexamination Certificate

active

07926002

ABSTRACT:
After layout design data has been modified using an OPC process, a repair flow is initiated. This repair flow includes analyzing the modified data to identify any remaining or new potential print errors in the layout data. Regions then are formed around the identified potential print errors, and a subsequent OPC process is performed only on the data within these regions using a different set of process parameters from the process parameters employed by the initial OPC process. This repair flow is iteratively repeated, where a different set of process parameter values for the subsequent OPC process is used during each iteration.

REFERENCES:
patent: 6684382 (2004-01-01), Liu
patent: 2002/0146628 (2002-10-01), Ota
patent: 2005/0234684 (2005-10-01), Sawicki et al.

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