System and method for checking for sub-resolution assist...

Details System and method for checking for sub-resolution assist... System and method for checking for sub-resolution assist...

2011-03-08

2011-03-08

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Analysis and verification

C716S054000

Reexamination Certificate

active

07904854

ABSTRACT:
In accordance with the invention, there is provided a system and method for checking a mask layout including sub-resolution assist features (SRAFs). A checking program divides each edge of each main feature into sections, forms a set of segments by searching perpendicularly over a distance to determine if any portion of a feature is located within the distance. Segments are then flagged based on whether a feature located within proximity to that segment. A classification program may then classify each of the main features based on the segment data.

REFERENCES:
patent: 2003/0208742 (2003-11-01), LaCour
patent: 2004/0078763 (2004-04-01), Lippincott
patent: 2004/0209169 (2004-10-01), Cui et al.
patent: 2005/0097501 (2005-05-01), Cobb et al.
patent: 2005/0202321 (2005-09-01), Gordon et al.
patent: 2005/0208396 (2005-09-01), Lippincott
patent: 2006/0166110 (2006-07-01), Melvin et al.

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