Selective shielding for multiple exposure masks

Details Selective shielding for multiple exposure masks Selective shielding for multiple exposure masks

2011-06-21

2011-06-21

Levin, Naum (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Manufacturing optimizations

C716S053000, C716S055000, C430S005000

Reexamination Certificate

active

07966585

ABSTRACT:
A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.

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