Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2011-06-28
2011-06-28
Levin, Naum (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
C716S124000, C430S313000
Reexamination Certificate
active
07971158
ABSTRACT:
A design structure is provided for spacer fill structures and, more particularly, spacer fill structures, a method of manufacturing and a design structure for reducing device variation is provided. The structure includes a plurality of dummy fill shapes in different areas of a device which are configured such that gate perimeter to gate area ratio will result in a total perimeter density being uniform across a chip.
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Anderson Brent A.
Bryant Andres
Nowak Edward J.
Rankin Jed H.
Cain David
International Business Machines - Corporation
Levin Naum
Roberts Mlotkowski Safran & Cole P.C.
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