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Apparatus for full wafer deposition

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Apparatus for growing group II-VI mixed compound semiconductor

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for growing single-crystalline semiconductor film

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for growing thin films

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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Apparatus for holding disk-shaped substrates in the vacuum chamb

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Apparatus for holding substrates

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for improved azimuthal thermal uniformity of a...

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for improved power coupling through a workpiece in a s

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for low pressure chemical vapor depostion

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for manufacturing a semiconductor device having a wafe

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for manufacturing semiconductor wafers

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for plasma treatment of semiconductor materials

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for plasma-supported back etching of a semiconductor w

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for preventing deposition on frontside peripheral regi

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for preventing plasma etching of a wafer clamp in semi

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for producing thin films by low temperature plasma-enh

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for providing depletion-free uniform thickness CVD thi

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for reduced-pressure epitaxial growth and method...

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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Apparatus for reducing entrapment of foreign matter along a...

Coating apparatus – Gas or vapor deposition – Work support
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Apparatus for supporting a substrate and introducing gas flow do

Coating apparatus – Gas or vapor deposition – Work support
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