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Rapid thermal heating apparatus including a substrate support an

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Rapid thermal processing apparatus for processing semiconductor

Coating apparatus – Gas or vapor deposition – Work support
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Rapid thermal processing susceptor

Coating apparatus – Gas or vapor deposition – Work support
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Rapid-switching rotating disk reactor

Coating apparatus – Gas or vapor deposition – Work support
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Reaction chambers for CVD systems

Coating apparatus – Gas or vapor deposition – Work support
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Reactor apparatus for semiconductor wafer processing

Coating apparatus – Gas or vapor deposition – Work support
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Reactor for coating plane substrates and method for...

Coating apparatus – Gas or vapor deposition – Work support
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Reactor for processing a microelectronic workpiece

Coating apparatus – Gas or vapor deposition – Work support
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Reduced friction lift pin

Coating apparatus – Gas or vapor deposition – Work support
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Reducing backside deposition in a substrate processing apparatus

Coating apparatus – Gas or vapor deposition – Work support
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Reflector apparatus for chemical vapor deposition reactors

Coating apparatus – Gas or vapor deposition – Work support
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Removable ring for controlling edge deposition in substrate proc

Coating apparatus – Gas or vapor deposition – Work support
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Retainer ring for securing substrates in a vacuum deposition sys

Coating apparatus – Gas or vapor deposition – Work support
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Rotary chuck including pins for lifting wafers

Coating apparatus – Gas or vapor deposition – Work support
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Rotary substrate processing apparatus and method

Coating apparatus – Gas or vapor deposition – Work support
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Rotating susceptor

Coating apparatus – Gas or vapor deposition – Work support
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