Apparatus for plasma treatment of semiconductor materials

Details Apparatus for plasma treatment of semiconductor materials Apparatus for plasma treatment of semiconductor materials

1978-03-13

1979-12-18

Powell, William A.

Coating apparatus

Gas or vapor deposition

Work support

204164, 204192EC, 204298, 250531, 250423R, 427 38, 156643, 156646, H01L 21306, C03F 0000

Patent

active

041788770

ABSTRACT:
An improved arrangement of electrode plates, semiconductor materials, electrode supports, and electrical power supplying circuitry is useful for plasma treatment of semiconductor materials in a reaction tube in the presence of a reaction gas.

REFERENCES:
patent: 3450617 (1969-06-01), Hellund
patent: 3875068 (1975-04-01), Mitzel
patent: 3971684 (1976-07-01), Muto
patent: 3984301 (1976-10-01), Matsuzaki et al.

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