Apparatus for improved azimuthal thermal uniformity of a...

Details Apparatus for improved azimuthal thermal uniformity of a... Apparatus for improved azimuthal thermal uniformity of a...

2011-06-21

2011-06-21

Estrada, Michelle (Department: 2823)

Coating apparatus

Gas or vapor deposition

Work support

C257SE23060, C118S729000, C118S730000

Reexamination Certificate

active

07964038

ABSTRACT:
Methods and apparatus for providing an improved azimuthal thermal uniformity of a substrate are provided herein. In some embodiments, a substrate support for use in a semiconductor process chamber includes a susceptor plate; and a supporting member to support a backside of the susceptor plate proximate an outer edge thereof, wherein the supporting member substantially covers the backside of the susceptor plate. In some embodiments, the substrate support is disposed in a process chamber having at least some lamps disposed below the supporting member and utilized for heating the back side of the susceptor plate.

REFERENCES:
patent: 5044943 (1991-09-01), Bowman et al.
patent: 6156079 (2000-12-01), Ho et al.
patent: 6599815 (2003-07-01), Yang
patent: 2001/0026012 (2001-10-01), Minamitani et al.
patent: 2003/0015141 (2003-01-01), Takagi
patent: 2005/0092439 (2005-05-01), Keeton et al.
patent: 2009/0098280 (2009-04-01), Tahon

Affiliated with

Also associated with

Rating

Apparatus for improved azimuthal thermal uniformity of a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for improved azimuthal thermal uniformity of a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for improved azimuthal thermal uniformity of a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2638662