Apparatus for manufacturing semiconductor wafers

Details Apparatus for manufacturing semiconductor wafers Apparatus for manufacturing semiconductor wafers

1992-10-08

1993-06-22

Jones, W. Gary

Coating apparatus

Gas or vapor deposition

Work support

118500, 269903, C23C 1600, B05C 1302

Patent

active

052213560

ABSTRACT:
Apparatus for semiconductor wafer manufacture in which a susceptor has an annular rotor for supporting a wafer substrate with a substrate surface facing downwards. The rotor has an annular flange overlying a body of the susceptor and the structure is such that a flow of rotor driving gas may be directed up from the body and against the flange while crystalline layers are being formed on the undersurface of the substrate.

REFERENCES:
patent: 5042423 (1991-08-01), Wilkinson
patent: 5077875 (1992-01-01), Hoke et al.

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