Apparatus for preventing plasma etching of a wafer clamp in semi

Details Apparatus for preventing plasma etching of a wafer clamp in semi Apparatus for preventing plasma etching of a wafer clamp in semi

1999-09-17

2000-12-26

Mills, Gregory

Coating apparatus

Gas or vapor deposition

Work support

156345, C23C 1600, C23C 1604

Patent

active

061652768

ABSTRACT:
An apparatus for preventing plasma etching wafer clamp is disclosed in a process chamber. The apparatus comprises a pedestal, a bottom electrode, a wafer clamp, a semiconductor wafer, a quartz ring, a top electrode, a cooling plate, a anodize, and a gas hole. The wafer clamp is used to secure the semiconductor wafer. However, the wafer clamp includes a clamp ring, a concave holder, and a depression. The clamp ring is used to support the semiconductor wafer. The concave holder has a semi-elliptical surface, polymer being formed on the backside of the concave holder to prevent plasma etching in the deposition or etching process, into the clamp ring. Then The depression is designed, higher position, adjacent the concave holder.

REFERENCES:
patent: 4842683 (1989-06-01), Cheng et al.
patent: 5262029 (1993-11-01), Erskine et al.
patent: 5292399 (1994-03-01), Lee et al.
patent: 5354382 (1994-10-01), Sung et al.
patent: 5534110 (1996-07-01), Lenz et al.
patent: 5569350 (1996-10-01), Osada et al.
patent: 5885428 (1999-03-01), Kogan
patent: 6007673 (1999-12-01), Kugo et al.

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