Apparatus for improved power coupling through a workpiece in a s

Details Apparatus for improved power coupling through a workpiece in a s Apparatus for improved power coupling through a workpiece in a s

1997-05-23

1999-08-24

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

Work support

118723I, 118723E, 118723R, 118500, 156345, 20429815, C23C 1600, H01J 3732, H01J 3734, H01L 2100

Patent

active

059420421

ABSTRACT:
Apparatus for supporting a wafer in a semiconductor wafer processing system. The apparatus contains a pedestal assembly, a ring assembly circumscribing the pedestal and an insulator between the pedestal assembly and ring assembly. The insulator electrically isolates the pedestal assembly from the ring assembly thereby preventing unwanted power coupling through the ring assembly.

REFERENCES:
patent: 5405480 (1995-04-01), Benzing et al.
patent: 5609691 (1997-03-01), Shuki
patent: 5630917 (1997-05-01), Guo
patent: 5803977 (1998-09-01), Tepman et al.
patent: 5863340 (1999-01-01), Flanigan

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