Use of multilayer amorphous carbon ARC stack to eliminate...
Use of multiple etching steps to reduce lateral etch undercut
Use of nanoscale particles for creating scratch-resistant...
Use of nitrides for flip-chip encapsulation
Use of nitrides for flip-chip encapsulation
Use of optimized film stacks for increasing absorption for...
Use of organic spin on materials as a stop-layer for local...
Use of oxalyl chloride to form chloride-doped silicon dioxide fi
Use of palladium in IC manufacturing
Use of palladium in IC manufacturing
Use of palladium in IC manufacturing with conductive polymer...
Use of palladium in IC manufacturing with conductive polymer...
Use of PE-SiON or PE-Oxide for contact or via photo and for...
Use of PE-SiON or PE-OXIDE for contact or via photo and for...
Use of phoslon (PNO) for borderless contact fabrication,...
Use of photoresist focus exposure matrix array as via etch...
Use of photoresist in substrate vias during backside grind
Use of poly resistor implant to dope poly gates
Use of polybenzoxazoles (PBOS) for adhesion
Use of polymer spacers for the fabrication of shallow trench iso