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Selected: N

N type impurity doping using implantation of P 2 + ions or...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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N+ poly on high-k dielectric for semiconductor devices

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N,N′-di(arylalkyl)-substituted naphthalene-based...

Semiconductor device manufacturing: process – Having organic semiconductive component
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N,N′-di(phenylalky)-substituted perylene-based...

Semiconductor device manufacturing: process – Having organic semiconductive component
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N-channel LDMOS with buried P-type region to prevent...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N-channel metal oxide semiconductor (NMOS) driver circuit...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N-channel MOSFET having STI structure and method for...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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N-containing plasma etch process with reduced resist poisoning

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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N-gate transistor

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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N-profile engineering at the poly/gate oxide and gate...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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N-type boron-carbide semiconductor polytype and method of...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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N-type buried layer drive-in recipe to reduce pits over...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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N-type transistor, production methods for n-type transistor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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N-well resistor as a ballast resistor for output MOSFET

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N.sub.2 O nitrided-oxide trench sidewalls and method of making i

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N/PMOS saturation current, HCE, and Vt stability by contact...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N/PMOS saturation current, HCE, and Vt stability by contact...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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N2/H2 chemistry for dry development in top surface imaging...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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N2O Nitrided-oxide trench sidewalls to prevent boron...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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NAND flash memory cell row and manufacturing method thereof

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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