Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-12-06
2005-12-06
Pham, Long (Department: 2814)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S614000, C438S125000, C438S666000
Reexamination Certificate
active
06972249
ABSTRACT:
A hermetically-sealed semiconductor flip-chip and its method of manufacture are disclosed. The semiconductor flip-chip of the present invention is sealed with a silicon nitride layer on an active surface of the flip-chip. The silicon nitride layer covers the chip active surface, including bond pads and conductive connectors such as solder balls formed over the bond pads to effect electrical and mechanical connection to terminal pads of a carrier substrate. A portion of the silicon nitride layer is penetrated or removed to expose a portion of each conductive connector. The flip-chip is then attached to a substrate by contact of the exposed portions of the conductive connectors with the terminal pads of the substrate. Also included in the invention is the alternative of sealing the flip-chip, substrate and intervening connectors with a silicon nitride layer after the attachment of the flip-chip to the substrate.
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Akram Salman
Farnworth Warren M.
Nguyen Dilinh
Pham Long
TraskBritt
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