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Oxygen ion implantation procedure to increase the surface area o

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxygen plasma reduction to eliminate precursor overflow in...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Oxygen plasma treatment for enhanced HDP-CVD gapfill

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Oxygen plasma treatment for nitride surface to reduce photo...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxygen-doped Al-containing current blocking layers in active...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Mesa formation
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Oxygen-doped in-situ doped amorphous silicon multilayer gate str

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Oxygen-free, dry plasma process for polymer removal

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Oxygen-rich layers underlying BPSG

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxynitride bilayer formed using a precursor inducing a high...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxynitride GTE dielectrics using NH.sub.3 gas

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Oxynitride laminate “blocking layer” for thin...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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Oxynitride shallow trench isolation and method of formation

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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Ozonated DI water process for organic residue and metal...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ozone treatment method and ozone treatment apparatus

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Ozone treatment of a ground semiconductor die to improve...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Including adhesive bonding step
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Ozone vapor clean method

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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Ozone-enhanced oxidation for high-k dielectric semiconductor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ozone-teos method for forming with attenuated surface...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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