Aluminum disposable spacer to reduce mask count in CMOS...

Aluminum gallium nitride/gallium nitride high electron...

Aluminum nitride and aluminum oxide/aluminum nitride...

AMEL display panel and method for fabricating the same

Ammonia annealed and wet oxidized LPCVD oxide to replace ono fil

Amorphous and polycrystalline silicon nanolaminate

Amorphous carbon contact film for contact hole etch process

Amorphous carbon layer for improved adhesion of photoresist...

Amorphous carbon layer for improved adhesion of photoresist...

Amorphous etch stop for the anisotropic etching of substrates

Amorphous silicon disposable spacer to reduce mask count in...

Analog capacitor having at least three high-k dielectric...

Analog capacitor in dual damascene process

Angle implant process for cellular deep trench sidewall doping

Angled halo implant tailoring using implant mask

Angled implant for shorter trench emitter

Angled implant to build MOS transistors in contact holes

Angled implant to build MOS transistors in contact holes

Angled implantation for deep submicron device optimization

Angled ion implantation for selective doping