Advanced technique for forming a transistor having raised...

Advanced titanium silicide process for very narrow...

Advanced trench isolation fabrication scheme for precision polys

Advanced trench sidewall oxide for shallow trench technology

Aerosol process for fabricating discontinuous floating gate...

After gate fabrication of field effect transistor having...

Aggressive capacitor array cell layout for narrow diameter...

Alignment dip back oxide and code implant through poly to...

Alignment of trench for MOS

Alignment system for planar charge trapping dielectric...

All-in-one disposable/permanent spacer elevated...

Alternate method and structure for improved floating gate...

Aluminum disposable spacer to reduce mask count in CMOS...

Aluminum disposable spacer to reduce mask count in CMOS...

Aluminum nitride and aluminum oxide/aluminum nitride...

Ammonia annealed and wet oxidized LPCVD oxide to replace ono fil

Amorphous carbon contact film for contact hole etch process

Amorphous carbon layer for improved adhesion of photoresist...

Amorphous carbon layer for improved adhesion of photoresist...

Amorphous etch stop for the anisotropic etching of substrates