Use of a grated top surface topography for capacitor structures

Use of a hard mask in the manufacture of a semiconductor device

Use of a metal contact structure to increase control gate coupli

Use of a rapid thermal anneal process to control drive current

Use of a selective hard mask for the integration of double...

Use of a single mask during the formation of a transistor's...

Use of a thin nitride spacer in a split gate embedded analog...

Use of a wet etch dip step used as part of a self-aligned...

Use of an etch to reduce the thickness and around the edges...

Use of atomic oxygen process for improved barrier layer

Use of borophosphorous tetraethyl orthosilicate (BPTEOS) to impr

Use of chlorine to fabricate trench dielectric in integrated...

Use of deuterated materials in semiconductor processing

Use of diamond as a hard mask material

Use of dilute steam ambient for improvement of flash devices

Use of dummy poly spacers and divot fill techniques for...

Use of etch to blunt gate corners

Use of functional memory cells as guard cells in a...

Use of gate electrode workfunction to improve DRAM refresh

Use of high-K dielectric material in modified ONO structure...