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Method of forming multiple gate oxide thicknesses using high den

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming multiple oxide layers with different...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming nanowire and method of manufacturing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Method of forming nitride films with high compressive stress...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming nitrided oxide in a hot wall single wafer...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming non-conformal layers

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Method of forming oxide film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming oxide layer in semiconductor device

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Method of forming oxidized film on SOI substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming oxynitride film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming passivation layers using deuterium containing

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming patterned indium zinc oxide and indium tin...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming phosphosilicate glass having a high wet-etch r

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming plasma nitrided gate dielectric layers

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming porous film and material for porous film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming pre-metal dielectric film on a...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reissue Patent

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Method of forming pre-metal dielectric film on a...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming pre-metal dielectric film on a...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming semiconductor compound film for...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming semiconductor device containing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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