Relaxed silicon germanium platform for high speed CMOS...
Remote plasma activated nitridation
Remote plasma nitridation to allow selectively etching of oxide
Remote plasma source seasoning
Removable amorphous carbon CMP stop
Removable amorphous carbon CMP stop
Removable amorphous carbon CMP stop
Removal of carbon from an insulative layer using ozone
Repair and restoration of damaged dielectric materials and...
Repair of carbon depletion in low-k dielectric films
Replenishment of surface carbon and surface passivation of...
Replenishment of surface carbon and surface passivation of...
Replication and transfer of microstructures and nanostructures
Replication and transfer of microstructures and nanostructures
Replication and transfer of microstructures and nanostructures
Residue removal process for forming inter-level insulating layer
Resist application method and device
Resist coating and developing processing apparatus
Resist pattern forming method and semiconductor device...
Restoring low dielectric constant film properties