Nano-crystal etch process

Details Nano-crystal etch process Nano-crystal etch process

2007-05-14

2010-02-09

Vinh, Lan (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S255000, C438S706000, C438S722000

Reexamination Certificate

active

07659210

ABSTRACT:
A method for selectively removing nano-crystals on an insulating layer. The method includes providing an insulating layer with nano-crystals thereon; exposing the nano-crystals to a high density plasma comprising a source of free radical chlorine, ionic chlorine, or both to modify the nano-crystals; and removing the modified nano-crystals with a wet etchant.

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