Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2008-05-13
2008-05-13
Lee, Hsien-ming (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C257SE21218, C257S492000, C156S345390
Reexamination Certificate
active
11242719
ABSTRACT:
A method and system for backside unlayering a semiconductor device to expose FEOL semiconductor features of the device for subsequent electrical and/or physical probing. A window is formed within a backside substrate layer of the semiconductor. A collimated ion plasma is generated and directed so as to contact the semiconductor only within the backside window via an opening in a focusing shield. This focused collimated ion plasma contacts the semiconductor, only within the window, while the semiconductor is simultaneously being rotated and tilted by a temperature controlled stage, for uniform removal of semiconductor layering such that the semiconductor features, in a location on the semiconductor corresponding to the backside window, are exposed. Backside unlayering of the invention may be enhanced by CAIBE processing.
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Kane Terence L
Miles Darrell L
Sylvestri John D
Tenney Michael P
Capella Steven
DeLio & Peterson LLC
Lee Hsien-ming
Nowak Kelly M.
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