LandOfFree - US Patents - Listing for Etching a substrate: processes,Masking of a substrate using material resistant to an etchant

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for forming pattern

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for hard mask CD trim

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for hard mask CD trim

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for making a sculptured diaphragm

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method for manufacturing a semiconductor device with ultra-fine

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for manufacturing porous structure and method for...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for manufacturing printing plate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for manufacturing semiconductor integrated circuit...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for pattern formation

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray

Method for patterning high density field emitter tips

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray

Method for patterning high density field emitter tips

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray

Method for patterning high density field emitter tips

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall

Method for pitch reduction

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method for preventing the etch transfer of sidelobes in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for producing a solid body including a microstructure

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for producing semiconductor optical device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method for producing tapered waveguide

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for reactive ion etching and apparatus therefor

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method for removing color resist for exposure alignment