Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Patent
1996-03-04
1999-03-30
Nguyen, Nam
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
216 2, 438759, 430319, 430320, B44C 122
Patent
active
058884122
ABSTRACT:
A sculptured diaphragm of a sensor is fabricated by providing a semiconductor material, forming at least one cavity on the front side of the semiconductor material, forming a diaphragm layer over the semiconductor material, and the etching a cavity on the back side of the semiconductor material. If a sensor having a diaphragm with a central boss is desired, then the diaphragm layer is planarized to form a thick and a thin portion in the diaphragm layer.
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Goldman Kenneth G.
McNeil Andrew C.
Shah Mahesh K.
Sooriakumar Kathirgamasundaram
Hightower Robert F.
Jackson Miriam
Motorola Inc.
Nguyen Nam
Ver Steeg Steven H.
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