Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
Reexamination Certificate
2011-05-17
2011-05-17
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Layout generation
C716S053000, C716S119000
Reexamination Certificate
active
07945873
ABSTRACT:
A method of generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data that represent a transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method, to acquire the transmitted light distribution, and generates mask pattern data that represent an arrangement of the shields, based on the determination.
REFERENCES:
patent: 6091492 (2000-07-01), Strickland et al.
patent: 7564590 (2009-07-01), Sugimoto
patent: 2006/0046162 (2006-03-01), Sekine
patent: 5-142752 (1993-06-01), None
patent: 6-109904 (1994-04-01), None
patent: 11-017945 (1999-01-01), None
patent: 2001-356470 (2001-12-01), None
patent: 2004-70087 (2004-03-01), None
patent: 2004-144841 (2004-05-01), None
patent: 2004-145319 (2004-05-01), None
patent: 2004-296590 (2004-10-01), None
patent: 2005-258349 (2005-09-01), None
patent: 2006-98985 (2006-04-01), None
patent: 2006-278356 (2006-10-01), None
patent: 2007-013640 (2007-01-01), None
Japanese Office Action dated Jun. 21, 2010, which issued in counterpart Japanese patent application No. 2007-335063.
Ito Masataka
Kurihara Masaki
Sato Nobuhiko
Sekine Yasuhiro
Shindo Hitoshi
Canon Kabushiki Kaisha
Do Thuan
Fitzpatrick ,Cella, Harper & Scinto
LandOfFree
Mask pattern data generating method, information processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask pattern data generating method, information processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask pattern data generating method, information processing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2637827