Mask pattern data generating method, information processing...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation

Reexamination Certificate

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C716S053000, C716S119000

Reexamination Certificate

active

07945873

ABSTRACT:
A method of generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data that represent a transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method, to acquire the transmitted light distribution, and generates mask pattern data that represent an arrangement of the shields, based on the determination.

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patent: 7564590 (2009-07-01), Sugimoto
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patent: 2007-013640 (2007-01-01), None
Japanese Office Action dated Jun. 21, 2010, which issued in counterpart Japanese patent application No. 2007-335063.

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