Method and apparatus for detecting lithographic hotspots in...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification

Reexamination Certificate

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C716S111000, C716S112000, C716S136000

Reexamination Certificate

active

07945870

ABSTRACT:
Method for detecting hotspots in a circuit layout includes constructing a layout graph having nodes, corner edges and proximity edges from the circuit layout, converting the layout graph to a corresponding dual graph, and iteratively selecting edges and nodes having weights greater than a predetermined threshold value at each iteration as hotspots.

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