MEEF reduction by elongation of square shapes

Details MEEF reduction by elongation of square shapes MEEF reduction by elongation of square shapes

2011-07-05

2011-07-05

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Analysis and verification

C716S119000, C700S098000, C700S120000, C700S121000, C430S005000, C378S035000

Reexamination Certificate

active

07975246

ABSTRACT:
A method that purposely relaxes OPC algorithm constraints to allow post OPC mask shapes to elongate along one direction (particularly lowering the 1-dimensional MEEF in this direction with the result of an effectively overall lowered MEEF) to produce a pattern on wafer that is circular to within an acceptable tolerance.

REFERENCES:
patent: 5821014 (1998-10-01), Chen et al.
patent: 5847419 (1998-12-01), Imai et al.
patent: 6194104 (2001-02-01), Hsu
patent: 6433620 (2002-08-01), Mashiko et al.
patent: 6451490 (2002-09-01), Advocate et al.
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6562719 (2003-05-01), Kondo et al.
patent: 6605816 (2003-08-01), Sandstrom
patent: 6625801 (2003-09-01), Pierrat et al.
patent: 6645677 (2003-11-01), Sandstrom
patent: 6656646 (2003-12-01), Hotta et al.
patent: 6764908 (2004-07-01), Kadosh et al.
patent: 6787271 (2004-09-01), Cote et al.
patent: 6792590 (2004-09-01), Pierrat et al.
patent: 6838216 (2005-01-01), Griesinger et al.
patent: 6839125 (2005-01-01), Hansen
patent: 6846595 (2005-01-01), Smith
patent: 6861183 (2005-03-01), Barber
patent: 6873720 (2005-03-01), Cai et al.
patent: 6907596 (2005-06-01), Kobayashi et al.
patent: 6918104 (2005-07-01), Pierrat et al.
patent: 6925202 (2005-08-01), Karklin et al.
patent: 6936506 (2005-08-01), Buller et al.
patent: 6942958 (2005-09-01), Chen et al.
patent: 6961186 (2005-11-01), Pierrat et al.
patent: 7003755 (2006-02-01), Pang et al.
patent: 7003757 (2006-02-01), Pierrat et al.
patent: 7014956 (2006-03-01), Chen et al.
patent: 7016017 (2006-03-01), Hansen
patent: 7030966 (2006-04-01), Hansen
patent: 7058923 (2006-06-01), Tounai et al.
patent: 7087476 (2006-08-01), Metz et al.
patent: 7093229 (2006-08-01), Pang et al.
patent: 7107573 (2006-09-01), Yamazoe et al.
patent: 7115343 (2006-10-01), Gordon et al.
patent: 7138649 (2006-11-01), Currie et al.
patent: 7153634 (2006-12-01), Sandstrom
patent: 7155689 (2006-12-01), Pierrat et al.
patent: 7180576 (2007-02-01), Hansen
patent: 7208357 (2007-04-01), Sadaka et al.
patent: 7245356 (2007-07-01), Hansen
patent: 7254251 (2007-08-01), Cai et al.
patent: 7266800 (2007-09-01), Sezginer
patent: 7305651 (2007-12-01), Cao
patent: 7323291 (2008-01-01), Sandstrom
patent: 7458059 (2008-11-01), Stirniman et al.
patent: 7655388 (2010-02-01), Tan et al.
patent: 2002/0050655 (2002-05-01), Travis et al.
patent: 2002/0125443 (2002-09-01), Sandstrom
patent: 2002/0164064 (2002-11-01), Karklin et al.
patent: 2002/0164065 (2002-11-01), Cai et al.
patent: 2002/0177050 (2002-11-01), Tanaka
patent: 2003/0129502 (2003-07-01), Chen et al.
patent: 2003/0188288 (2003-10-01), Kobayashi et al.
patent: 2003/0198872 (2003-10-01), Yamazoe et al.
patent: 2004/0156030 (2004-08-01), Hansen
patent: 2004/0158808 (2004-08-01), Hansen
patent: 2004/0170906 (2004-09-01), Chen et al.
patent: 2004/0172610 (2004-09-01), Liebmann et al.
patent: 2004/0229169 (2004-11-01), Sandstrom
patent: 2004/0248016 (2004-12-01), Lucas et al.
patent: 2005/0044513 (2005-02-01), Robles et al.
patent: 2005/0076316 (2005-04-01), Pierrat et al.
patent: 2005/0089768 (2005-04-01), Tanaka et al.
patent: 2005/0148195 (2005-07-01), Koehle et al.
patent: 2005/0190957 (2005-09-01), Cai et al.
patent: 2005/0280104 (2005-12-01), Li
patent: 2006/0078805 (2006-04-01), Hansen
patent: 2006/0126046 (2006-06-01), Hansen
patent: 2006/0146307 (2006-07-01), Hansen et al.
patent: 2006/0147813 (2006-07-01), Tan et al.
patent: 2006/0172204 (2006-08-01), Peng et al.
patent: 2006/0228851 (2006-10-01), Sadaka et al.
patent: 2006/0240342 (2006-10-01), Tang
patent: 2006/0266243 (2006-11-01), Percin et al.
patent: 2006/0269851 (2006-11-01), Frisa et al.
patent: 2006/0277520 (2006-12-01), Gennari
patent: 2006/0281016 (2006-12-01), O'Brien
patent: 2007/0009808 (2007-01-01), Abrams et al.
patent: 2007/0038973 (2007-02-01), Li et al.
patent: 2007/0050749 (2007-03-01), Ye et al.
patent: 2007/0101310 (2007-05-01), Stirniman et al.
patent: 2007/0105029 (2007-05-01), Ausschnitt
patent: 2007/0105058 (2007-05-01), Sandstrom
patent: 2007/0121090 (2007-05-01), Chen et al.
patent: 2007/0292017 (2007-12-01), Cai et al.
patent: 2008/0189673 (2008-08-01), Ying
patent: 2009/0031262 (2009-01-01), Maeda et al.
patent: 2010/0037195 (2010-02-01), Becker et al.
patent: 2010/0180253 (2010-07-01), Ying
patent: 2010/0196805 (2010-08-01), Tan et al.
patent: 1357426 (2003-10-01), None
patent: 1647862 (2006-04-01), None
patent: 1793279 (2007-06-01), None
patent: 2002116529 (2002-04-01), None
Crouse, U.S. Appl. No. 12/021,527, Office Action Communication, Jun. 22, 2010, 15 pages.
Chudzik, U.S. Appl. No. 12/061,081, Office Action Communication, Jun. 25, 2010, 8 pages.
Ruggles, U.S. Appl. No. 12/021,527, Office Action Communication, Nov. 2, 2010, 24 pages.
Kraig, U.S. Appl. No. 12/061,081, Office Action Communication, Nov. 30, 2010, 28 pages.

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