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Reaction chamber for a chemical vapor deposition apparatus and a

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Reaction chamber for an epitaxial reactor

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Reaction chamber for an epitaxial reactor

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Reaction chamber having non-clouded window

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Reaction chamber with at least one HF feedthrough

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Reaction chamber with decreased wall deposition

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Reaction chambers for CVD systems

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Reaction chambers for CVD systems

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Reactor and method for chemical vapor deposition

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Reactor and susceptor for chemical vapor deposition process

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Reactor apparatus for semiconductor wafer processing

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Reactor assembly and processing method

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Reactor chamber

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Reactor design for uniform chemical vapor deposition-grown films

Coating apparatus – Gas or vapor deposition
Patent

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Reactor for coating plane substrates and method for...

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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Reactor for continuous coating of glass

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Reactor for depositing a layer on a moving substrate

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Reactor for depositing thin film on wafer

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Reactor for epitaxial growth

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Reactor for extended duration growth of gallium containing...

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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