Reaction chamber having non-clouded window

Details Reaction chamber having non-clouded window Reaction chamber having non-clouded window

1990-03-14

1991-04-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 118620, 427 531, 427 541, C23C 1648

Patent

active

050055194

ABSTRACT:
A reaction chamber for performing a chemical vapor deposition process wherein the window through which the light must pass is prevented from becoming clouded. The chamber is divided by baffles into a reactant zone, a buffer zone, and a window zone, and the momentum flux densities of the gases flowing in the respective zones are about matched. Additionally, discontinuities are provided on the walls of the reactor to impede diffusion of the reactant gas towards the window.

REFERENCES:
patent: 4435445 (1984-03-01), Allred

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