Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2006-06-06
2006-06-06
Alejandro-Mulero, Luz (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S7230AN, C156S345100, C156S345440, C174S262000
Reexamination Certificate
active
07056388
ABSTRACT:
A reaction chamber for carrying out substrate coating methods is disclosed, having at least one opening in at least one outer wall in which an HF feedthrough is inserted in a pressure or vacuum tight manner. The reaction chamber is further characterized by a combination of the following features: a support plate with coolant channels, and at least one opening for an HF line; an HF line collar in the zone disposed in the reaction chamber, a first seal on the collar; a first disc from an insulating material between a second seal on the support plate and the first seal on the collar; a thread in the zone outside the reaction chamber, a screw element being screwed onto the thread, all configured to prevent an electrical contact between the HF line and the support plate being established or an arc-over between the HF line and the support plate occurring.
REFERENCES:
patent: 3435128 (1969-03-01), Dorwald
patent: 5855681 (1999-01-01), Maydan et al.
patent: 6203620 (2001-03-01), Moslehi
patent: 0 109 808 (1984-05-01), None
patent: 852026 (1940-01-01), None
patent: WO 97/42648 (1997-11-01), None
patent: WO 00/22646 (2000-04-01), None
Franken Walter
Jurgensen Holger
Kappeler Johannes
Strauch Gerd
Aixtron AG
Alejandro-Mulero Luz
St. Onge Steward Johnston & Reens LLC
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