Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-01-16
2007-01-16
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S641000, C118S715000, C156S345370, C156S345330
Reexamination Certificate
active
10071908
ABSTRACT:
A reactor assembly and processing method for treating a substrate generally includes a base unit, a chuck assembly, a process chamber, an inlet manifold assembly and an exit manifold assembly. The inlet manifold assembly is in fluid communication with a first opening of the process chamber, wherein the inlet manifold assembly comprises a flow-shaping portion adapted to laterally elongate a gas and/or a reactant flow into the process chamber. The exhaust manifold assembly in fluid communication with a second opening of the process chamber and is diametrically opposed to the inlet manifold assembly. The process includes flowing a gas and/or reactive species into the process chamber of the reactor assembly in a direction that is about planar with the substrate surface providing improved uniformity and increased reactivity.
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Ferris David
Kinnard David William
Axcelis Technologies Inc.
Cantor & Colburn LLP
Zervigon Rudy
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