Reactor chamber

Details Reactor chamber Reactor chamber

2007-01-30

2007-01-30

Moore, Karla (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S715000

Reexamination Certificate

active

10719416

ABSTRACT:
A semiconductor processing chamber having an upper wall, a lower wall, and two side walls. The upper and lower walls each comprise two thin, flat plates that are slightly out of parallel so that the wall has a pitch. The pitches point away from the interior chamber space to enable the chamber to withstand reduced pressures.

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