Heater unit for chemical vapor deposition systems

Heater with detachable ceramic top plate

Heater with shadow ring and purge above wafer surface

Heater/lift assembly for high temperature processing chamber

Heating apparatus using induction heating

Heating apparatus with enhanced thermal uniformity and...

Heating crucible and deposition apparatus including the same

Heating device coating plant and method for evaporation or...

Heating device containing a multi-lamp cone for heating...

Heating device used for a gas phase growing mechanism or heat tr

Heating element CVD system and connection structure between...

Heating element for use in a hot filament chemical vapor...

Heating furnace and semiconductor wafer-holding jig assembly...

Hermetically-sealed inductively-coupled plasma source...

Hermetically-sealed inductively-coupled plasma source...

High aspect ratio clamp ring

High capacity epitaxial reactor

High density inductively and capacitively coupled plasma chamber

High density plasma chemical vapor deposition chamber

High density plasma CVD reactor with combined inductive and capa