Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2005-08-23
2005-08-23
Leung, Philip H. (Department: 3742)
Coating apparatus
Gas or vapor deposition
With treating means
C118S728000, C219S634000, C219S635000, C219S649000, C219S651000
Reexamination Certificate
active
06932872
ABSTRACT:
A heating apparatus which is installed in a low pressure CVD system or annealing equipment for use in semiconductor integrated circuit manufacturing processes for heat-treating wafers on which IC's are to be formed, wherein wafers are uniformly heated, the temperature of wafers is rapidly raised and lowered, and wafers are processed in high volume, wherein the apparatus comprises a cylindrical body made of glass-like carbon placed inside a reactor, and a high-frequency induction coil which is placed outside the reactor and is for causing the cylindrical body made of glass-like carbon to produce heat and thereby heating wafers in the reactor.
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(Kobe Steel, Ltd.)
Leung Philip H.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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