Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-05-22
1997-02-04
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 156345, C23C 1600
Patent
active
055993966
ABSTRACT:
An inductively coupled plasma chamber having a capacitor electrode during cleaning of the plasma chamber.
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Andrieu, X. et al., "New Conducting Polymer Networks", Journal of Power Sources, 43-44 (1993) pp. 445-451.
Collier Susan B.
Kunemund Robert
Micro)n Technology, Inc.
Paladugu Ramamohan Rao
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