Heater unit for chemical vapor deposition systems

Details Heater unit for chemical vapor deposition systems Heater unit for chemical vapor deposition systems

1999-03-29

2000-08-22

Beck, Shrive

Coating apparatus

Gas or vapor deposition

With treating means

118728, C23C 1600

Patent

active

061066281

ABSTRACT:
In a chemical vapor deposition system, a pair of turntables are vertically disposed opposite to each other, and a plurality of wafers to be processed are arranged circumferentially on opposing surfaces of the turntables. Heater units are arranged behind the turntables, each of the heater units comprising a plurality of concentric grooves defined in a surface of a base behind the corresponding one of the turntables, a heating element received in each of the grooves, a cover plate placed over the grooves so as to seal the interior of the grooves from the exterior of the grooves, and a conduit connected to a vacuum pump for maintaining a higher level of vacuum in the grooves than outside cover plate. Thus, the interior of the grooves is effectively sealed, and intrusion of contaminants into the heater unit can be avoided.

REFERENCES:
patent: 5038711 (1991-08-01), Dan et al.
patent: 5427620 (1995-06-01), deBoer et al.
patent: 5554224 (1996-09-01), Foltyn
patent: 5679405 (1997-10-01), Thomas et al.
patent: 5688331 (1997-11-01), Arunga et al.

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