Processing chamber configured for uniform gas flow

Processing chamber configured for uniform gas flow

Processing chamber for atomic layer deposition processes

Processing chamber for atomic layer deposition processes

Processing chamber with flow-restricting ring

Programmable ultraclean electromagnetic substrate rotation appar

Protective coating for dielectric material on wafer support used

Pultruded conveyor slats

Purge gas in wafer coating area selection

Quick release process kit

Rapid thermal heating apparatus including a substrate support an

Rapid thermal processing apparatus for processing semiconductor

Rapid thermal processing susceptor

Rapid-switching rotating disk reactor

Reaction chambers for CVD systems

Reactor apparatus for semiconductor wafer processing

Reactor for coating plane substrates and method for...

Reactor for processing a microelectronic workpiece

Reduced friction lift pin

Reducing backside deposition in a substrate processing apparatus