Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2008-09-09
2008-09-09
Hassanzadeh, Parviz (Department: 1792)
Coating apparatus
Gas or vapor deposition
Work support
C118S729000, C118S730000, C156S345510, C156S345520, C156S345530, C156S345540, C156S345550
Reexamination Certificate
active
11552727
ABSTRACT:
An apparatus and method for performing uniform gas flow in a processing chamber is provided. In one embodiment, an apparatus is an edge ring that includes an annular body having an annular seal projecting therefrom is provided. The seal is coupled to a side of the annular body opposite a side adapted to seat on the substrate support. In another embodiment, a processing system is provided that includes a chamber body, a lid, a substrate support and a plurality of flow control orifices. The lid is disposed on the chamber body and defining an interior volume therewith. The substrate support is disposed in the interior volume and at least partially defines a processing region with the lid. The flow control orifices are disposed between the substrate support and the lid. The flow control orifices are adapted to control flow of gases exiting the processing region.
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Chen Ling
Chung Hua
Grunes Howard
Ku Vincent
Applied Materials Inc.
Dhingra Rakesh K
Hassanzadeh Parviz
Patterson & Sheridan LLP
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