Reducing backside deposition in a substrate processing apparatus

Details Reducing backside deposition in a substrate processing apparatus Reducing backside deposition in a substrate processing apparatus

1994-06-20

1995-12-19

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

Work support

118729, 118500, 118503, 4272481, 437225, C23C 1600, B05L 1300, H01L 2100

Patent

active

054765480

ABSTRACT:
A substrate processing apparatus for processing a substrate having a peripheral edge, an upper surface for processing and a lower surface lying on a support. The apparatus includes a processing chamber which houses the substrate support, in the form of a heater pedestal including a substrate receiving surface for receiving the lower surface of the substrate. A circumscribing shadow ring is located around the pedestal to cover peripheral edge portion of the substrate. The shadow ring also defines a cavity, between itself and the pedestal, at the peripheral edge of the substrate. In operation, the chamber receives processing gas at a first pressure and purge gas is introduced into the cavity, between the ring and the pedestal, at a second pressure which is greater than the first pressure. Fluid conduits are provided to enhance the flow of the purge gas away from the peripheral edge of the substrate.

REFERENCES:
patent: 5230741 (1993-07-01), van de Ven
patent: 5238499 (1993-08-01), van de Ven et al.
patent: 5262029 (1993-11-01), Erskine
patent: 5292554 (1994-03-01), Sinha
patent: 5326725 (1994-07-01), Shertinsky
patent: 5328722 (1994-07-01), Ghanayem

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