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Sputtering alloy films using a crescent-shaped aperture

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering alloy films using a sintered metal composite target

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering alloy target and method of producing an alloy film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and film deposition method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and film forming method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and film forming method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and film manufacturing method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and method for manufacturing compound thin

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and method of preventing damage thereof

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and process for forming lamination film emp

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and process for high rate coatings

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and process for high rate coatings

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and sputter film deposition method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus and sputtering method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus for improved step coverage

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering apparatus for sputtering high melting point metal...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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