Sputtering apparatus and method of preventing damage thereof

Details Sputtering apparatus and method of preventing damage thereof Sputtering apparatus and method of preventing damage thereof

2005-12-30

2010-10-26

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C118S728000

Reexamination Certificate

active

07820016

ABSTRACT:
A sputtering apparatus includes a container; a plate for supporting the container; a first attachment for attaching the container to the plate; and a second attachment for less tightly attaching the container to the plate than through the first attachment.

REFERENCES:
patent: 5860640 (1999-01-01), Marohl et al.
patent: 6846396 (2005-01-01), Perrin
patent: 2004/0232109 (2004-11-01), Yoshinaga
patent: 2005/0150463 (2005-07-01), He et al.
patent: 62136238 (1987-06-01), None
patent: 63118062 (1988-05-01), None
patent: 4-325679 (1992-11-01), None
patent: 06188303 (1994-07-01), None
patent: 2005-29850 (2005-02-01), None
patent: 10-2004-0033403 (2004-04-01), None
Office Action issued in Korean Application No. 10-2005-0055521.

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