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Carbon fiber and copper support for physical vapor...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Carbon target material for forming carbon thin film and process

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cathode assembly having rotating magnetic-field shunt and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cathode having variable magnet configuration

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cathode targets of silicon and transition metal

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cathode targets of silicon and transition metal

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cathode targets of silicon and transition metal

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Central coil design for ionized metal plasma deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ceramic substrates and magnetic data storage components prepared

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Chamber design with isolation valve to preserve vacuum during ma

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Chemical vapor deposition apparatus and cleaning method thereof

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Chemically bonded diamond films and method for producing same

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Chemically-enhanced physical vapor deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Circularly symmetric sputtering apparatus with hollow-cathode pl

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Circularly symmetric, large-area, high-deposition-rate sputterin

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Clamp and target assembly

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cleaning of a PVD chamber containing a collimator

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cleaning of a PVD chamber containing a collimator

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Cluster tool with a hollow cathode array

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Co-based alloy sputter target and process of manufacturing the s

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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