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P1 notched write head with minimum overmilled p1 and p2

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Pane with transmission properties that vary with the angle of in

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Partially filling copper seed layer

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Particle implantation apparatus and particle implantation...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Particle trap in a magnetron sputtering chamber

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Passive bipolar arc control system and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Pasting layer formation method for high density plasma...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Pasting method for eliminating flaking during nitride...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Pattern forming method using charged particle beam process and c

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Pattern forming method using charged particle beam process...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Pattern transfer process utilizing multilevel resist structure f

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Patterned copper etch for micron and submicron features, using e

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Patterned medium, method for fabricating same and method for...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Periodically clearing thin film plasma processing system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Periodically clearing thin film plasma processing system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Periodically clearing thin film plasma processing system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Perpendicular magnetic recording medium

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Phase changeable material

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Photo mask blank and method of manufacturing the same

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Photoelectric enhanced plasma glow discharge system and method i

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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