Sputtering apparatus and method for manufacturing compound thin

Details Sputtering apparatus and method for manufacturing compound thin Sputtering apparatus and method for manufacturing compound thin

1998-02-04

2000-06-27

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429807, 20429808, 20429811, 20429819, C23C 1434

Patent

active

060802847

ABSTRACT:
A compound thin film, conforming to the stoichiometry, can be obtained by a magnetron sputtering method employing a thin film manufacturing apparatus wherein the film forming portion of the vacuum chamber is separated from the sputtering portion of the vacuum chamber by a multi-apertured partition, whereby sputtered molecules are permitted to pass through the apertures of the partition while sputter gas ions are hindered from passing through the apertures of the partition. The composition of the resulting compound thin film conforms to the stoichiometry of its components.

REFERENCES:
patent: 4572842 (1986-02-01), Dietrich et al.
patent: 4824544 (1989-04-01), Mikalesen et al.
patent: 4901667 (1990-02-01), Suzuki et al.
patent: 4931158 (1990-06-01), Bunshah et al.
patent: 4988424 (1991-01-01), Woodward et al.
patent: 5164221 (1992-11-01), Someno et al.
patent: 5178739 (1993-01-01), Barnes et al.
patent: 5228963 (1993-07-01), Rose
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5415753 (1995-05-01), Hurwitt et al.
patent: 5516403 (1996-05-01), Forster et al.
Jpn. J. Appl. Phys. vol. 34 (1995) pp. L1332-L1335; Part 2, No. 10B, Oct. 15, 1996; Nakamura et al; "Superbright Green InGaN Single-Quantum-Well-Structure Light-Emitting Device".

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