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Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter deposition utilizing pulsed cathode and substrate...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter deposition with mobile collimator

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter device

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter enhanced ion implantation process

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter etching apparatus with plasma source having a dielectric

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter etching chamber having a gas baffle with improved unifor

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter etching chamber with improved uniformity

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter source, sputtering device, and sputtering method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter target and method of using a sputter target

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter target based on titanium dioxide

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter targets with expansion grooves for reduced separation

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter textured magnetic recording medium

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter-coating target and method of use

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputter-CVD process for at least partially coating a workpiece

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtered films of bismuth/tin oxide

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtered films of metal alloy oxides and method of preparation

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtered indium oxide films

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtered mask defined with highly selective side wall chemical

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtered multilayer magnetic recording media with...