Sputter enhanced ion implantation process

Details Sputter enhanced ion implantation process Sputter enhanced ion implantation process

1988-06-02

1989-08-08

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 204298, 148 4, C23C 1434

Patent

active

048550264

ABSTRACT:
A sputter enhanced ion implantation process is disclosed that uses to advantage the ion beam sputtering phenomenon to deposit layers of coatings on surfaces of interest simultaneously with ion implanting that surface, and that without the use of a separate evaporation system. The process can be applied to almost any workpiece of varied geometries. The process can be used for the deposition of hard coatings as well as ion implanting soft solid lubricants into various substrates. The process is particularly suitable for improving the physical and chemical properties of workpieces exposed to excessive wear, erosion, corrosion and fatigue and workpieces benefitting from a reduced coefficient of friction, such as ball bearings, gears, toolings, orthopaedic surgical implants and the like.

REFERENCES:
patent: 3900636 (1975-08-01), Curry et al.
patent: 3925116 (1975-12-01), Engel
patent: 4465524 (1984-08-01), Dearnaley et al.
patent: 4693760 (1987-09-01), Sioshansi
patent: 4747922 (1988-05-01), Sharp
Weissmantel et al., "Preparation . . . Methods", Thin Solid Films, 63 (1979), pp. 315-325.
R. A. Kant et al, "Ion Beam Modification of TiN Films During Vapor Deposition", Materials Science & Engineering, 90 (1987), 357-365.
F. A. Smidt et al, "U.S. Navy Manufacturing Technology Program on Ion Implantation", Materials Science & Engineering, 90 (1987), 385-397.
C. Weissmantel, "Ion Beam Deposition of Special Film Structures ", J. Vac. Sci. Technology, 18 (2), Mar. 1981, 179-185.

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