Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-05-17
2005-05-17
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192150, C204S192160
Reexamination Certificate
active
06893542
ABSTRACT:
Improved multilayer magnetic superlattice structures, such as (Co/Pt)nand (C0/Pd)n, having perpendicular magnetic coercivities as high as about 10,000 Oe, are formed by sputtering in Kr and/or Xe atmospheres at relatively high power densities and relatively small target-to-substrate spacings. The magnetic superlattice structures are advantageously utilized in the formation of the thermally stable, perpendicular magnetic recording media having ultra-high areal recording densities of from about 100 Gbit/in2to about 600 Gbit/in2.
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JPO Abstract Translation of JP 01-148417A (Clipped Image No. JP402148417A)
JPO Abstract Translation of JP 08-017032A (Clipped Image No. JP408017032A).
McDonald Rodney G.
Seagate Technology LLC
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