Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-02-28
1998-02-17
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 2041921, 427129, 427130, 427131, 427132, G23C 1434, B05D 512
Patent
active
057188114
ABSTRACT:
A magnetic recording medium exhibiting improved glide and CSS characteristics is produced by depositing a metallic layer on a non-magnetic substrate, as by sputtering, so that the deposited metallic layer has a textured surface. In one embodiment, a Ti-base alloy layer having a textured surface comprising a plurality of relatively uniform protrusions is sputter-deposited directly onto a non-magnetic substrate, such as Ni-P coated aluminum-magnesium alloy substrate, or an electrically conductive graphite substrate, and a magnetic layer deposited on the sputtered metallic layer with or without a Cr underlayer.
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Chen Ga-Lane
Yuen Kwok H.
Breneman R. Bruce
McDonald Rodney G.
Seagate Technology Inc.
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