Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-08-05
1995-04-04
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419223, 20419226, 20429812, 20429813, 20429814, C23C 1434
Patent
active
054034582
ABSTRACT:
A sputter coating target which alleviates the need for anode reconditioning due to a buildup of a nonconductive coating comprises a coating component which itself or its reactive product is substantially electrically nonconductive and a dopant component which itself or its reactive product is substantially electrically conductive.
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"Performance And Sputtering Criteria Of Modern Architectural Glass Coatings:", SPIE vol. 325, Optical Thin Films (1982).
"Production Techniques For High Volume Sputtered Films", SPIE vol. 325, Optical Thin Films (1982).
Hartig Klaus W.
Lingle Philip J.
Breneman R. Bruce
Guardian Industries Corp.
McDonald Rodney G.
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